Dear Collegues, After posted my questions about the thick photoresist, I received many helpful answers and I'd like to share with you who are interested with this issue. The answers are: 1. The NR series photoresist produced by Futurrex (www.futurrex.com) -- recommended by Dr P. Jin 2. Shipley SPR 220 resist -- recommended by Rob Hardman 3. AZ9200-series and 4500-series from Clariant (www.clariant.com)-- recommended by Niklas Mayerhofer and Dirk Grobe 4. Shipley microposit SJR 5740 -- recommended by Hong Qiao These answers provided abundant options in thick photoresist applications, but they all have a thickness limit below 100 microns, so I'm still curious is there any positive resist with the thickness of more than 300um, which is sensitive for UV light and easy to be removed by chemical liquid. Another question: Does Clariant produce all of the AZ- tittled resist? Why I can not find AZ4562 in Clariant's web pages? Really do appreciate your help. Best Wishes, Hongjun Zeng Microfabrication Applications Laboratory (MAL) University of Illinois at Chicago ERF Building, 842 W. Taylor Street Chicago, IL 60607-7022 Room 3014 ERF Tel.: 312-413-5889, Fax: 312-996-6465 -----Original Message----- From: hzeng [mailto:hzeng@ece.uic.edu] Sent: Tuesday, July 02, 2002 1:12 PM To: mems-talk@memsnet.org Cc: mems-talk-admin@memsnet.org; Hongjun Zeng Subject: AZ4562 or other thick photoresist Dear Collegues, Could you help me to reach the answer of following questions, 1. Where can I get the AZ4562 photo resist, especially in US? 2. Is there any extreme thick photoresist else which can be easily removed by chemical liquid such as acetone? Thanks for your attention, Hongjun Zeng Microfabrication Applications Laboratory (MAL) University of Illinois at Chicago ERF Building, 842 W. Taylor Street Chicago, IL 60607-7022 Room 3014 ERF Tel.: 312-413-5889, Fax: 312-996-6465