Hello,

there is a paper about patterning AZ photoresist to up to 200microns

- Advanced resist processing for thick photoresist applications; E. Cullmann, B.
Loechel, A. Maciossek, M. Rothe; Microelectronic Engineering 30 (1196) 551-554



----- Original Message -----
From: "hzeng" 
Date: Tue, 2 Jul 2002 13:12:13 -0700
To: 
Subject: [mems-talk] AZ4562 or other thick photoresist


> Dear Collegues,
>
> Could you help me to reach the answer of following questions,
>
> 1. Where can I get the AZ4562 photo resist, especially in US?
> 2. Is there any extreme thick photoresist else which can be easily removed
> by chemical liquid such as acetone?
>
> Thanks for your attention,
>
> Hongjun Zeng
> Microfabrication Applications Laboratory (MAL)
> University of Illinois at Chicago
> ERF Building, 842 W. Taylor Street
> Chicago, IL 60607-7022
> Room 3014 ERF
> Tel.: 312-413-5889, Fax: 312-996-6465
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>

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