Hi,

I'm using Emulsitone Company's Borofilm 100 spin-on dopant to boron dope
2" Si wafers. After the diffusion has been completed (1100 C for 15 min)
there is a residual film left on the Si substrate irrespective of how long
I etch the film in 10 % HF solution. Has anybody run across a similar
problem and suggest an etchant to remove the film ?  (I concluded that
there is a film on the surface because water sticks to the surface, while
it does not do so for a bare Si wafer). Thank you for the help in advance.

Nirmal Govindaraju