Hi,

We have a rather unusual situation:

1.We have a 3D pattern created on Si. The 3D pattern is created in a metal.
2.We'd like to transfer the 3D pattern into Si by etching the metall AND Si
(i.e., first the metal is etched, but since it has a varying thickness,
etching of Si begins thereby transferring the pattern into Si).

Question: can this be done? What process, parameters, etc?

Any preference viz-a-viz the metal (Al, Cu, Ti, etc)?

Thanx,
David