Hello,

I am currently grafting Allytrichlorosilane on glass. I get get a nicely
dewetting surface with 2hour deposition at at -20C to -30C in 1part ATS -
70parts Toluene - 30parts Methylenechlorid solution.

The cooling helps a lot.

I cleaned and oxydized the galss wafers using oxygene plasma - piranha etch -
oxygene plasma instead of H2O2.


A paper that might be interesting for you (if you didn't read it already since
it is referenced in paper you mentioned):

Langmuir 1994,10, 4367-4373 4367
Silanization of Solid Substrates: A Step toward
Reproducibility
J. B. Brzoska,? I. Ben Azouz, and F. Rondelez*


Greetings

Danny





----- Original Message -----
From: Robert Johnstone 
Date: Tue, 9 Jul 2002 12:36:00 -0700 (PDT)
To: mems-talk@memsnet.org
Subject: [mems-talk] ODTS and Alkene SAMs


> Hello Everyone,
>
> I recently tried to apply a SAM to my surface micromachined structures
following
> the recipe found in the literature.  Specifically, I used the recipe from
> "Alkyltrichlorosilane-Based Self-Assembled Monolayer Films for Stiction
> Reduction in Silicon Micromachines," JMEMS, v7, n2, pp252.
>
> However, I don't believe the SAM formation took place.  When the chips were
> removed from the final rinse, they did not dewet.
>
> I'd like to know what problems other people have had in reproducing this
> procedure.  Are there additional conditions that need to be met for success?
>
> Because of the known reproducibility problems of the ODTS process, we are
> considering moving to the Alkene process outlined in "Alkene based monolayer
> films as anti-stiction coatings for polysilicon MEMS," S&A:A, v91, pp239.
What
> experiences have people had with this process?
>
> Thanks in advance,
>
> ----------------------------------------
> Robert Johnstone
> Simon Fraser University
> http://www.sfu.ca/~rjohnsto/
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>

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