Hello Marty,

Yes, our company produces a number of products wherein photoresist is
utilized as a permanent dielectric layer.  We've found a number of positive
resists that suit the purpose over the years, including AZ4400.  A few
trials over your particular mesa step should give the thickness answer; I
would start at 1:1 with coated resist thickness.  The step height will also
dictate the resist choice.

You'll need a method to make the photoresist permanent, a simple HPO bake
above Tg for a few minutes might suffice for prototyping activity.

Regards, Justin

Justin C. Borski
MEMS Program Manager
Advanced MicroSensors Inc.
(508) 770 - 2088


-----Original Message-----
From: Martin O. Patton [mailto:patton@er.com]
Sent: Tuesday, July 23, 2002 9:06 AM
To: MEMS-talk@memsnet.org
Subject: [mems-talk] photo resist dielectric layer


Dear MEMS-talkers,

Does anyone use photo resist for an interlayer dielectric, for example to
run conductors over a mesa edge?  If so, what kind?

Thanks,

Marty

Martin O. Patton
Senior Research Engineer
Essential Research Inc.
6410 Eastland Road Suite D
Cleveland, Ohio 44142
www.er.com
(440)816-9850
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