durusmail: mems-talk: Aluminum etch problem
Aluminum etch problem
2002-07-24
2002-07-24
Aluminum etch problem
Greg Miller
2002-07-24
You can used MIF327 works quite well for removing Al depending on how
thick - it is very slow.
Thanks,

Greg Miller
KVH Industries
Email: gmiller@kvh.com


-----Original Message-----
From: Robert Dean [mailto:rdean@Eng.Auburn.EDU]
Sent: Tuesday, July 23, 2002 5:20 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] Aluminum etch problem


>Hello,

I have a fab process where I need to pattern a thin aluminum layer that
has
been deposited on copper.  Unfortunately, the aluminum etch I have is
PAE,
which also etches copper.  Any suggestions other than Cl2 RIE?  The
aluminum layer is used as a mask for a later processing step and could
be
changed to another metal.

Sincerely,

Robert Dean

Research Associate IV
Center for Advanced Vehicle Electronics
Auburn University
200 Broun Hall
Auburn, AL 36849

Voice: 334-844-1838
Fax:   334-844-1898
Email: rdean@eng.auburn.edu
Web: http://www.eng.auburn.edu/~rdean/index.htm
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