You can used MIF327 works quite well for removing Al depending on how thick - it is very slow. Thanks, Greg Miller KVH Industries Email: gmiller@kvh.com -----Original Message----- From: Robert Dean [mailto:rdean@Eng.Auburn.EDU] Sent: Tuesday, July 23, 2002 5:20 PM To: mems-talk@memsnet.org Subject: [mems-talk] Aluminum etch problem >Hello, I have a fab process where I need to pattern a thin aluminum layer that has been deposited on copper. Unfortunately, the aluminum etch I have is PAE, which also etches copper. Any suggestions other than Cl2 RIE? The aluminum layer is used as a mask for a later processing step and could be changed to another metal. Sincerely, Robert Dean Research Associate IV Center for Advanced Vehicle Electronics Auburn University 200 Broun Hall Auburn, AL 36849 Voice: 334-844-1838 Fax: 334-844-1898 Email: rdean@eng.auburn.edu Web: http://www.eng.auburn.edu/~rdean/index.htm _______________________________________________ MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk Hosted by the MEMS Exchange, providers of MEMS processing services. Visit us at http://www.memsnet.org/