Hi Karen,

Do you know if a silicon process & a Ge process can be run
through the same wetbench without cross-contamination ?

Thanks, Maurice

Maurice H. Norcott
Senior R&D Technician
Silicon Genesis Corporation
590 Division Street
Campbell, CA 95008
408-228-5847
Pager 408-977-6333





-----Original Message-----
From: Attenborough, Karen [mailto:Karen.Attenborough@Onstream.com]
Sent: Thursday, August 01, 2002 7:29 AM
To: 'mems-talk@memsnet.org'
Subject: RE: [mems-talk] Cleaning Germainium Wafers


Hi Maurice

In the past, I have used Ge and used the following process steps to clean
it.

        rinse in cold and hot Acetone, followed by cold and hot IPA
        dip 1 min. in 10% NH4OH:H2O
        rinse at least 10 min. in DI-water
blow dry with special care because Germanium is hydrophilic

I only used small pieces of wafer, so the above process may not be perfectly
compatible with what you are using.

Hope this helps
With best wishes

Karen Attenborough


Dr. Karen Attenborough
OnStream MST  B.V.
Lodewijkstraat 1
5652 AC Eindhoven
The Netherlands
Tel:  +31.40.295.9814
Fax: +31.40.295.9906
Email: karen.attenborough@onstream.com
www.onstreammst.com



-----Original Message-----
From: Maurice Norcott [mailto:mnorcott@sigen.com]
Sent: 01 August 2002 04:02
To: 'mems-talk@memsnet.org'
Subject: [mems-talk] Cleaning Germainium Wafers


Sorry, I should have been more specific. I have a wafer cleaning sink
with megasonics etc. What I am looking for is recommended chemistries
to clean the Ge wafers in.


Maurice H. Norcott
Senior Technician
Silicon Genesis Corporation
590 Division Street
Campbell, CA 95008

408-871-3948 Office
408-977-6333 Pager
Mnorcott@Sigen.com
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