Hello,

I am wondering if someone has successfully used a masking layer, photoresist
or metal, to etch BCB at a rate faster than 1 um per minute in a CF4/O2
Plasma.

thanks,

Lester Lspez
Research Assistant
Microwave and Wireless Research Group
University of South Florida
4202 East Fowler Avenue, ENB 118
Tampa, Florida 33620
PH: 813-974-4851
FAX: 813-974-5250
Email: lelopez@eng.usf.edu