I'd like to know who has a small tabletop drie system
capable of etching 10 u circular or square holes
through 5 - 10 u deep thermal silicon dioxide
anisotropically. 300nm thick Cr will be etch mask. My
samples are 4" wafers or smaller. If anybody knows
reasonable price range, that'd be also very helpful.

-Soojin
Grad. Stud.
Univ. of North Carolina


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