Dear David

There was a paper on this issue at the Eurosensor 2000 conference from C.
Bergenstof Nielsen.

Regards,

Jamil El-Ali

-----Original Message-----
From: PEYRADE David [mailto:PEYRADEDa@chartreuse.cea.fr]
Sent: 30. september 2002 16:53
To: 'mems-talk@memsnet.org'
Subject: [mems-talk] Fe contamination in KOH etching of silicon


Dear Mems Researchers,
I use KOH (prepared with prolabo powder) etching on Si (100) wafer, to
realize microreactors.
Here are the typical wet etching conditions : T=75°C, t=45min, KOH 40%M.
I do observe Fe particules (diameter < 500 nm) at the bottom of the
microreactors and suspect the KOH
product to introduce this pollution.
1) Does anyone have already observed this phenomenum ?
2) And do you have an idea to eliminate this pollution ?
Thanks a lot
 Best Regards,
David Peyrade




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