Magali, I would recommend injecting some negative pulses into your plating current. You will have to do some experimenting to see what the amplitude and frequency should be, however, that should work. Regards, Mike Mattes Medtronic, Inc. >>> mbrunet@nmrc.ucc.ie 10/17/02 12:58AM >>> Dear all, On a silicon wafer where a Cu seed layer is sputtered, I am depositing photoresist (8um thick) to create patterns and then electroplating NiFe through the patterns (5um thick). The deposit has an even thickness except at the edges where there is a big overplating. (kind of "dog hears") Does anyone have an idea on how to get rid of this edge problem? Thanks a lot in advance, Magali -- PEI Technologies, NMRC, Lee Maltings, University College, Cork, Ireland. Tel: +353 21 4 904279 Fax: +353 21 4 270271 email: mbrunet@nmrc.ie _______________________________________________ MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk Hosted by the MEMS Exchange, providers of MEMS processing services. Visit us at http://www.memsnet.org/