Hi,

Can I use PMMA as a resist when I'm etching e-beam evaporated SiO2 layer
above the Au-layer?
Does HF etch Au or Ti?
Can I use pure dilute HF or does it have to be buffered with HN3F for some
reason?

How can I wet-etch Au slowly (~100 nm/min)?
Can I etch Au with RIE and with what resist?

Thanks already,

Sampo Tuukkanen, nanoelectronics Group, University of Jyväskylä, Finland