durusmail: mems-talk: etching Si-N, but not Al2O3
etching Si-N, but not Al2O3
etching Si-N, but not Al2O3
kirt_williams@agilent.com
2002-10-22
> I wonder if somebody can suggest any etchants that
> etch PECVD Si-N, but do not etch or etch very slowly
> alumina coating. Thanks in advance for your help
> Honggang Jiang

We've looked at a number of wet etchants, but none of them will work.
An SF6-based plasma will work.
        --Kirt Williams Agilent Technologies


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