E Liang, Try Caynon Materials they make - Gray Scale masks - Thanks, Greg Miller KVH Industries 8412 W 185th Street Tinley Park, IL 60477 Email: gmiller@kvh.com -----Original Message----- From: Enzhu Liang [mailto:eliang@ucdavis.edu] Sent: Tuesday, November 19, 2002 4:00 AM To: mems-talk@memsnet.org Subject: [mems-talk] special photolithography needed Hello everyone, Can we do intentionally uneven exposure to the photoresist? Just imagine a semisphere containing the photoresist and I am going to get uniform exposure on the surface of the semisphere. This will require the UV light intensity stongest in the center and weakest at the edges.If you happen to know this, could you please tell me how to do it or suggest some reading about it? Thank you very much. Best regards, E.Liang _______________________________________________ MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list options, visit http://www.memsnet.org/mailman/listinfo/mems-talk Hosted by the MEMS Exchange, providers of MEMS processing services. Visit us at http://www.memsnet.org/