The gray-scale mask may do it. The mask could
be very expensive, though.

--- Enzhu Liang  wrote:
> Hello everyone,
>
> Can we do intentionally uneven exposure to the
> photoresist? Just imagine a semisphere containing
> the photoresist and I am going to get uniform
> exposure on the surface of the semisphere. This will
> require the UV light intensity stongest in the
> center and weakest at the edges.If you happen to
> know this, could you please tell me how to do it or
> suggest some reading about it? Thank you very much.
>
> Best regards,
>
> ¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡¡E.Liang
> ¡¡¡¡¡¡¡¡¡¡
>
>
>
>
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