Dear E. Liang

To go with what Bill Moffat wrote...

Depending on the complexity of the intensity distribution you need, you
could try a planoconvex lens to direct the rays on the edge toward the
centre.

Regards,

Chris Blanford

On Wednesday, November 20, 2002, at 06:52 AM, Enzhu Liang wrote:

> Can we do intentionally uneven exposure to the photoresist? Just
> imagine a semisphere containing the photoresist and I am going to get
> uniform exposure on the surface of the semisphere. This will require
> the UV light intensity stongest in the center and weakest at the
> edges.If you happen to know this, could you please tell me how to do
> it or suggest some reading about it? Thank you very much.
--
Christopher F. Blanford
Inorganic Chemistry Laboratory, South Parks Road, Oxford, OX1 3QR, UK
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