I have a colleague who is interested in using a LPCVD nitride mask on
bare silicon wafers (one side polished) during a 10 hour KOH (45%) etch
at 85 C.  I would appreciate recommendations on the following....

a) vendor suggestions for performing the LPCVD nitride
b) minimum nitride thickness required
c) any other precations or concerns

Thanks,

--
Dr. Kevin M. Walsh
Electrical Engineering Department, Speed Scientific School
University of Louisville, Louisville, KY 40292
(502) 852-0826

Internet address: kmwals01@starbase.spd.louisville.edu