foo foo, A possible reason is poor adhesion at the edges of the etch line caused by water molecules retained on the Gold surface. We had similar rough edges to every thing we etched in the silicon world had a ragged edge whether we used wet or plasma etch. When we started vacuum vapor priming we created a water free surface for the resist to adhere to and we got straight etch lines. I do not know of any one using HMDS vacuum priming on Gold but there are specific adhesion promoters for Gold that work in vacuum vapor primers. Let me know if I can be of any help. Bill Moffat -----Original Message----- From: foo foo [mailto:skruttpost@hotmail.com] Sent: Tuesday, December 03, 2002 6:48 AM To: mems-talk@memsnet.org Subject: [mems-talk] Rough edges in wet etch dear all I am etching a thin gold layer about 10-30nm thick with a wet etch, KI. I am using PMMA polymer as an etch mask. My problem is that I get very rough edges, by that I mean uneven edges, on the metal after the etching. Does anyone have any ideas why this happens. Regards Patrick _________________________________________________________________ Hela veckans väder http://www.msn.se/vader _______________________________________________ MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk Hosted by the MEMS Exchange, providers of MEMS processing services. Visit us at http://www.memsnet.org/