Dear members,
I am running a litho process line. For our dry etching process I need a
photoresist with a thickness of 6-9µm. It should have good thermal
resistance properties and good adhesion. Stability and reproducibility is
also a concern as the resist is going to be used in a production.
Step profile is not important as I have large structures. Could anybody
recommend a photoresist?

Mounir Ennabli, M. Sc. E. E.
Grundfos Semiconductor
Direct: +45 44 34 71 58
Fax: +45 44 34 71 72
e-mail: mennabli@grundfos.com

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