I try to etch polyimide (DuPont Pyralin 2611) in a O2-plasma (RIE) and I
always get some residue on the wafer.
Does anybody know how to solve this problem ?

Thanks in advance,

Ralf

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Dipl. Ing. (FH) Ralf Keller

Fraunhofer-Institut fuer Biomedizinische Technik
Fraunhofer Institute for Biomedical Engineering
Ensheimer Str. 48
66386 St. Ingbert, Germany
Tel.: +49 (0) 6894 / 980-158     Fax: ..-400
e-mail: ralfk@ibmt.fhg.de