Hello,

I'm a new-comer on the mailing list of MEMS Electronic Discussion Group.
However, I have been working in MEMS area since 1991.
 During my Ph.D in the Institut des Microtechniques de Franche-Comte,
Besancon, France, I worked on the mechanical properties of thin films
fabricated with micro-electronics and semiconductor technologies. I
developed an experimental set-up (Bulge test) in order to measure the
main characteristics of thin films : Elastic constants, Young=92s modulus=
,
Poisson ratio, and, of course, internal stresses.=20

Now, I am a post-doctoral fellow and I work in the field of Optical MEMS
at the Kawakatsu Laboratory at the University of Tokyo, Institut of
Industriel Sciences. My main subject is the development of a new
silicon-based integrated interferometer with phase modulation by
elasto-optic effect. Phase modulation is performed through a
piezo-electric ZnO thin film transducer deposited on the reference arm
of the interferometer.

In order to perform many numerical simulations, I'm looking for the
mechanical properties of Silicon Nitride deposited by LPCVD process.
Could anyone help me ?
I'm looking forward your suggestions.

E. Bonnotte=20
--=20
Dr. Eric Bonnotte
LIMMS/Kawakatsu laboratory / CNRS/IIS-The University of Tokyo
7-22-1 Roppongi Minato-ku Tokyo 106 JAPAN
Tel/FAX : +81-3-3402-9568
Tel/Fax Home : +81-3-3411-5381
E-mail : ebon@cc.iis.u-tokyo.ac.jp