Dear Colleagues,

Am searching for practical information / experience on patterning
hydrophobic layers. For example, depositing a hydrophobic layer (i.e.
C4F8) on a silicon substrate, spinning on positive or negative
photoresist (achieving good coverage with or without the use of an
adhesive intermediate layer), achieving good lithographic results,
and etching the hydrophobic layer resulting in a patterned
hydrophobic layer while the silicon retains its surface properties.
Alternatively, using a successful lift-off process. Any experiences,
information, recipes, etc would be greatly appreciated.

Best regards,

Jessica Melin

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    Jessica Melin
    Royal Institute of Technology
    Department of Signals, Sensors and Systems
    Microsystem Technology
    Osquldas väg 10, 5th floor
    SE-100 44 Stockholm, Sweden

    Phone:              +46 (0)8 790 9231
    Fax:                        +46 (0)8 100858
    Mobile:             +46 (0)73 944 3031
    Email:              melin@s3.kth.se

    Homepage:         http://www.s3.kth.se/mst
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