>
> I try to etch polyimide (DuPont Pyralin 2611) in a O2-plasma (RIE) and I
> always get some residue on the wafer.
> Does anybody know how to solve this problem ?
>
> Thanks in advance,
>
> Ralf
>
> ****************************************
> Dipl. Ing. (FH) Ralf Keller
>
> Fraunhofer-Institut fuer Biomedizinische Technik
> Fraunhofer Institute for Biomedical Engineering
> Ensheimer Str. 48
> 66386 St. Ingbert, Germany
> Tel.: +49 (0) 6894 / 980-158     Fax: ..-400
> e-mail: ralfk@ibmt.fhg.de
>
>
>