Hi Greg,

We have used normal photoresist for that purpose. It's not a
good thermal conductor, but a thin layer (make it less that
1um) is not a big barrier for heat flow either. We haven't
done any calculations, but I would suspect the temperature
drop across it would be less than across the wafer thickness.
Removal is very easy in Acetone (slightly heated if necessary).
Of course this works only if you stay below the temperature
where resist degrades thermally (125 deg C is fine).

Greetings,
        Frank Berauer
        Senior R&D Engineer
        Hewlett-Packard Singapore


-----Original Message-----
From: Greg Miller [mailto:gmiller@kvh.com]
Sent: Thursday, January 23, 2003 10:03 PM
To: General MEMS discussion
Subject: [mems-talk] thermal conductive glue


Mems Group,

I'm looking for a good thermal conductive glue that will bond two silicon
wafers together - and be release after a few operation that require good
thermal conductivity, vacuum compatible, temperature range between -20 to
125 C.

Thanks,

Greg Miller
KVH Industries
Email: gmiller@kvh.com

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