Michael,
        The etch rate depends upon the temperature you can allow your device to
go to.  One of our customers is etching 8 microns of cured Polymide in 5
minutes.  He is using our 8" plasma resist stripper with 2Kw power.  What power,
temperature, pressure and plasma unit are you using.  He is using close to your
ratios of CF4 in his case I think it is 30%.  He is however using 250 degrees C.
He has a need to remove the Poly fast for production reasons and his devices are
not temperature sensitive.  Bill Moffat

-----Original Message-----
From: haixinzhu [mailto:haixin.zhu@asu.edu]
Sent: Wednesday, February 05, 2003 1:47 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] Etching rate for BCB


Dear all,

I am trying to etch BCB layer using 1:4 CF4/O2, anyone know the etching rate?

Thanks.

Michael
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