Pablo,
      It may be that lift off is a better answer.  I have seen a reverse picture
sub micron 0.5 micron pillars 1.2 micron high used for a lost contact process.
I have also seen 800 Angstrom lines and spaces using image reversal and lift
off.  If you think this can help let me know.  Bill Moffat

-----Original Message-----
From: Pablo B [mailto:pablob127@yahoo.com]
Sent: Monday, February 10, 2003 3:18 PM
To: MEMS-talk
Subject: [mems-talk] Etching holes in aluminum


Hi!

We need to etch some submicron holes in an Aluminum
layer  over GaAs. The holes would be patterned on PMMA
using e-beam lithography. Is there any wet chemical
etchant that will etch away the Al leaving holes of
reasonable quality? Is reactive ion etching the only
way?

Thank you very much!

Bye & Good Luck!

Pablo B.


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