Hi Bill!

On Tue, Feb 11, 2003 at 08:18:59AM -0800, Bill Moffat wrote:

> It may be that lift off is a better answer.  I have seen a reverse
> picture sub micron 0.5 micron pillars 1.2 micron high used for a
> lost contact process.  I have also seen 800 Angstrom lines and
> spaces using image reversal and lift off.  If you think this can
> help let me know.  Bill Moffat

I have never been exposed to image reversal techniques. How do they work?
If lift off is possible, that would be very convenient!

Thanks a lot for your help!

Bye & Good Luck!

Pablo B.

>
> -----Original Message-----
> From: Pablo B [mailto:pablob127@yahoo.com]
> Sent: Monday, February 10, 2003 3:18 PM
> To: MEMS-talk
> Subject: [mems-talk] Etching holes in aluminum
>
>
> Hi!
>
> We need to etch some submicron holes in an Aluminum
> layer  over GaAs. The holes would be patterned on PMMA
> using e-beam lithography. Is there any wet chemical
> etchant that will etch away the Al leaving holes of
> reasonable quality? Is reactive ion etching the only
> way?
>