About 85 +-2 deg. C is perfect. Though I use a slightly different
recipe: 8 H2O: 7 HCl : 1 HNO3 by volume.

Good luck,
   Mike

>>> yungsik@amed.snu.ac.kr 02/17/03 06:21PM >>>
Dear

I'm trying to etch Pt layer on a glass wafer.
I sputtered Ti and Pt 1000A and 3000A thick respectively on a 4" glass
wafer.
I patterned with AZ1512 first and then tried to etch the Pt layer with
aqua regia( HCl:HNO3=3:1).
But I couldn't identify any etching of the Pt.

Do I need to heat the aqua regia to etch the Pt layer?
If I do not raise the temperature, can't I etch the Pt?
Then What is the proper temperature?

I hope to get your reply soon...

Thank you...
Have a nice day~~!!




Shin, Young Shik,
Master Candidate
Micro-BioMechanics Team, Advanced Machine Element Design Laboratory,
School of Mechanical & Aerospace Engineering, Seoul National
University

yungsik@amed.snu.ac.kr   youngshik@digital-bio.com



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