durusmail: mems-talk: Photopatterning
Photopatterning
Photopatterning
Zbigniew P. Sobczak
2003-03-09
Dear Sandhya:

It is recommended to employ Negative Resist NR9-8000 from Futurrex in this
application. NR9-8000 develops away from 500 µm deep through-holes. Positive
resists do not perform in this application.

Sincerely,

Zbigniew P. Sobczak
Futurrex, Inc.
T: 973-209-1563
E-mail: zpsobczak@futurrex.com
www.futurrex.com
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