Gowtham, The only way to get a good film at room temperture is with an IonBeam sputter deposition system. They put down very high quality films at room temperature, you can even use photoresist as a liftoff mask. It works well. I hope this info helps, Charles Ellis, Auburn University Microelectronics Laboratory Quoting Gowtham Vangara: > Hi Everyone, > I am trying to do a deposition of silicon nitride, at room temperature , > which is very vital for my research project. The temperature that would suit > the deposition is 300 degrees. I ve done the deposition at 300 successfully. > I want to know how I could deposit the film at room temperature, or at a max > 70. One of the Suggestions that i ve received is to increase the rf power. > but before advancing i would like to get some suggestions from people if they > have done this before. > thanks and regards, > Gowtham Vangara, > Graduate Research Assistant, > Department of Electrical Engineering, > High Density Electronic Center(HiDEC), > University Of Arkansas, > Fayetteville, AR 72701 > _______________________________________________ > MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list > options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk > Hosted by the MEMS Exchange, providers of MEMS processing services. > Visit us at http://www.memsnet.org/ >