You have to deposit it with hydrogen.  In our case, we found the optimum level
is at 25% hydrogen 75% argon.  We use RF sputterer. RegardsZainal

"Xi, Jingqun"  wrote:
Is there any people has the experience to deposit the thin film of
crystalline silicon in the low temperature processing environment? I need
to
know which kind of technique can do such thing.

Regards,

Jingqun Xi


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