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mems-talk
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run-in/run-out errors in alignment of photomasks (Wei Tang)
native PDMS least water contact angle (첸로)
run-in/run-out errors in alignment of photomasks (Edouard Duriau)
FOX (flowable oxide) as nanoimprint resist (righeira carnegie)
native PDMS least water contact angle (XIANG LI)
run-in/run-out errors in alignment of photomasks (Wei Tang)