durusmail: mems-talk: PDMS residue imprint
State of the MEMS/MST Industry Data ?
PDMS residue imprint
2003-06-01
PDMS residue imprint
Alik Widge
2003-06-01
I recall seeing one paper where PDMS microstamps were extracted overnight
in chloroform to remove low molecular weight residues. I personally have
not had the problem you describe, so I've never tried the extraction. You
should expect, though, that it would cause swelling of your PDMS (as most
organic solvents do), so if the PDMS is adhered to something already, I
suspect it would delaminate due to the strain of the expansion.

Alik Widge
MEMS Laboratory
Carnegie Mellon University


--On Friday, May 30, 2003 4:02 PM -0500 Christopher Khoury
 wrote:

> Group,
>
> is anyone familiar with removing excess residues or uncured monomer from
> PDMS? A patterned imprint residue is highly noticable anytime PDMS comes
> in contact with glass in particular. Usually this imprint can be seen
> through side illumination or scattering off the glass.        So far I've
tried
> pulsed and unpulsed sonication of the PDMS mold in both water and dilute
> ethanol, this only seems to improve things marginally.
>
> Thanks,
>
> C. Khoury
>
>
> Christopher Khoury
> Microsystems Engineer
> Nanosphere, Inc.
> 1818 Skokie Blvd Suite 200
> Northbrook IL 60062
> 847-656-0240
>
> This transmission may contain confidential information which belongs to
> the sender. This information is intended only for the use of the
> individual or entity named above.  If you are not the intended
> recipient, you are hereby notified that any disclosure, reproduction, or
> distribution of this information, or any action taken in reliance on the
> contents of this information is strictly prohibited.  No confidentiality
> or privilege is waived or lost by any miss transmission.  If you have
> received this transmission in error, please notify us immediately at
> (847) 562-8880 and return the email to the sender by reply.
>
>



reply