SiO2 is a good mask for KOH

-----Original Message-----
From: M.C Liu [mailto:mcliu@ite-corp.com]
Sent: Friday, June 27, 2003 8:49 AM
To: General MEMS discussion
Subject: Re: [mems-talk] help for silicon etching


I had used KOH and HNA in my experiment.But I can't get a satisfied result
to use nickel mask in KOH and photoresist mask in HNA.Waht's a convenient
material for mask?


----- Original Message -----
From: 
To: Sukanta ; General MEMS discussion

Sent: Thursday, June 26, 2003 3:56 PM
Subject: Re: [mems-talk] help for silicon etching


> There are many chemical processes for etching silicon available in the
literature. Depending on masking material if any that is being used and the
rate of silicon etch you are looking for we use to use an HF/Acetic/Nitric
acid. The reaction is very strong with good exhaust required to prevent
exposure to the operator but is will etch silicon. Bob Henderson