Hi Myung Kwon,
in case you use positive photoresist, I would suggest
you to try XeF2 instead of Fluorine based plasma and
after that acetone should work perfectly. In case you
have an access to supercritical CO2 process as I do,
it is as another option.
In case you are intersted to try the XeF2 out, send us
a wafer (wafers) and we can etch Molybdenum for you.
It is very simple process.
Pavel Neuzil
SiMEMS Pte Ltd
Singapore

neuzils@yahoo.com
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Dear Folks

After Mo pattering by RIE, PR stripping is difficult
without oxidation
with
conventional microwave asher using O2 plasma.
As you know, O2 plasma is very active,  Kinds of Mo,
Al, Cu, etc.metals
are oxidized with easy.
Dose any one knows other methods not to oxidize metals
above mentioned?



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