Hi,

I would like to know what is the range of the typical maximum thickness that I
could achieve sputtering Si?

Also, the rate of deposition would vary between what?

Thank's,

Guy Haché, M.Sc.A.
Assistant de recherche, research assistant
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Département de génie électrique et de génie informatique
Université de Sherbrooke
2500, boulevard Université
Sherbrooke (Québec) Canada
J1K 2R1
Téléphone/phone : (819) 821-8000 3706
Télécopieur/fax : (819) 821-7937
e-mail: guy.hache@usherbrooke.ca
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