durusmail: mems-talk: CVD deposition inside a high-aspect ratio
CVD deposition inside a high-aspect ratio
2003-09-22
CVD deposition inside a high-aspect ratio
ravula murty
2003-09-22
Hi Marc,
        We did do deposition of Oxide in trenches of
the aspect ratio of 150-200. We maintained
temperatures of 800C and a mixture of dichlorosilane
and nitrous oxide gases was used. The deposion rate is
low but our application needed only thin oxides so we
used LPCVD to deposit oxide and the deposition was
conformal.
Regards,
 Murty Ravula.


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