Hi,

 I am trying to etch (strip) nickel that was used as a mask for ICP RIE
etching of substrates using Ar and SF(6) over extended periods of time
(more than 2 hours). The Nickel has turned black and also is not etching
using a commercial Ni etch solution that I bought from Alfa Aesar. Did
anybody had the same problem earlier? I will appreciate if someone could
provide some suggestions or solutions to the problem.

Abhijat

EE MEMS Group
Department of Electrical Engineering,
Penn State Univ.