Hi. I'm preparing a degree thesis about RIE process at the IMM centre of Naples.
I'm looking for some processing parameters about glass and LiNbO3 etching, for
some particular parameters and operating actions about experiments done through
a OXFORD 80 PLUS RIE machine.I'm also interested in the effects of the use of an
aluminum mask in silicon etch through a CHF3 based plasma. If anyone has some
information about these things or about something else that regards RIE, PLEASE
help me. THANKS