durusmail: mems-talk: thick photoresist development
thick photoresist development
2004-02-16
2004-02-17
2004-02-17
2004-02-17
2004-02-18
2004-02-18
thick photoresist development
sappasamy@APPLIEDIMAGE.com
2004-02-16
Hey Quing,

 Try increasing the exposure time. It is not easy to get perfect straight
walls using AZ 4620. The bottom layers are not exposed very well leading to
the unmasked resist staying on after development that causes less than 90
deg angles of the sidewalls.

Sreeram

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