Hello Jo, I have noticed that chromium gets effectively etched in an oxygen plasma atmosphere in a standard Tepla Plasma System 300 stripper. (1000W, could look up pressure and flow if you want.) It was not a desired effect: I was just trying to strip the resist, instead both the chromium and the resist disappeared. Using SiO2 as a masking material should therefore work. The oxygen plasma stripper I used for this got quite dirty, so you might not want to use the highest quality ICP for this. It was however easy to clean the chamber with some propanol. Please tell mems-talk how it went (etch profile etc.) if it works (or if it doesn't). Good luck! /Sjoerd Royal Institute of Technology Department of Signals, Sensors and Systems Microsystem Technology Stockholm, Sweden > From: jo ed> Subject: [mems-talk] plasma chrome etch > To: mems-talk@memsnet.org > Message-ID: <20040307123144.41429.qmail@web21502.mail.yahoo.com> > Content-Type: text/plain; charset=us-ascii > > Hi All, > > Does anyone have a good plasma chrome etch recipee? > The masking layer I will be using can either be > photoresist or si02. > > cheers, > jo