Yes. For Berkeley PSG (similar P content), unannealed, I measured ER = 1.5 um/min in 10:1 HF. --Kirt Williams ----- Original Message ----- From: "Paul Vescovo"To: Sent: Friday, March 19, 2004 3:10 AM Subject: [mems-talk] PSG etch rate in HF:H2O Dear all, There is a critical flaw on devices I worked out recently. A possible explanation for it is the complete etching of 1.8um of PSG (6%P) during a RCA (15s in HF(49%):H2O 1:10 at 20°C). Is this hypothesis sensible ? Thank you, paul