Mike,
     I can not say for sure but I suspect HMDS will work.  If not call me.  I am
original designer of the vacuum vapor primer and we have a new unit for
deposition of odd silanes for copper capping etc.  This can put down controlled
levels of say APTES 4 Angstroms, 6,8 10 etc.  Bill Moffat 408 954 8353.

-----Original Message-----
From: Michael Woodson [mailto:mwoodson@chem.duke.edu]
Sent: Monday, April 05, 2004 12:51 PM
To: MEMS-exchange mailing list
Subject: [mems-talk] monolayer HF resist?


Hello, everyone! I need to form a monolayer on a Si surface
that can survive in HF long enough for some small (about2nm)
SiO2 structures to be removed.  This is for an AFM lithography
experiment, and resolution is important, so the resist must be
a monolayer or multilayer.  Can HMDS survive if the concentration
and exposure times are low?

Thanks in advance,
Mike Woodson
Duke University


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