Lisen-

Your etch rate will probably be on the order of 0.2 microns per minute using
a fluorocarbon/oxygen mixture. You should use a chromium mask, if you have
the capability, as you will find that using photoresist will be problematic.


Michael Marrs
Process Engineer
Trion Technology
+1 (480) 968-8818 ext. 25
mike@triontech.com