Hello everyone, I need to etch a 5kA layer of CVD oxide and not punch through a thin (300A) layer of gold (on 200A Ti). We have tried running a fairly polymerizing C4F8 chemistry at low (150W) bias, but it is still punching through the gold layer (with 20% overetch) Has anyone come across this problem before ? We'd like to stay with RIE if possible. As always, many thanks folks. -neo man --------------------------------- Do you Yahoo!? Win a $20,000 Career Makeover at Yahoo! HotJobs