Hi Li,

I have seen this when I have changed the write head and forgot to change
the write head setting in the software, or when I have used an energy
setting that is too low.

Best of Luck

Mark
University of Louisville

>>> liw@andrew.cmu.edu 05/22/04 12:33 PM >>>
Hello,

I met a problem with Heidelberg DWL machine when I made mask. The
machine
is to scan the blank mask to directly expose out the pattern on mask. My

problem is that I found the exposed area are not fully covered by the
scan
line. After developing I can see the scan line and the unexposed area
between the scan line which I also want to expose. Did anybody has idea
about this problem? This is weekend and I can not reach the manufacture.
So
I resort to this board to get a quick answer. Please reply directly to
my
email address.
Thanks in advance.

Li Wang
Carnegie Mellon University




_______________________________________________
MEMS-talk@memsnet.org mailing list: to unsubscribe or change your list
options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk
Hosted by the MEMS Exchange, providers of MEMS processing services.
Visit us at http://www.memsnet.org/