Hi, I am wondering if anyone has an electronic copy of the following journal paper and wouldn't mind to forward it to me. Thank you very much! Title: A model of the chemical processes occurring in CF4/O2 discharges used in plasma etching Author(s): Plumb, I.C.; Ryan, K.R. Journal title: Plasma Chemistry and Plasma Processing Volume and Issue number: vol.6, no.3 Inclusive page numbers: 205-30 Publication year: 1986 Yours sincerely, Isaac Chan Ph.D. Candidate Dept. Electrical & Computer Engineering University of Waterloo 200 University Ave. W Waterloo, Ontario, Canada N2L 3G1 Tel: (519) 888-4567, ext. 6014 Fax: (519) 746-6321 iwchan@venus.uwaterloo.ca http://www.ece.uwaterloo.ca/~a-sidic