A fluorescence microscope is good for detecting resist residue.

Roger Shile

-----Original Message-----
From: mems-talk-bounces@memsnet.org
[mailto:mems-talk-bounces@memsnet.org] On Behalf Of Yilei Zhang
Sent: Monday, June 28, 2004 12:54 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] photoresist remove

Hello all:
If using photoresist as mask material, sometimes we need to make sure
that no
photoresist left on the area that will be etched. is there any way to
make sure
all exposed photoresist are removed after developing? thanks.

Regards,
Yilei Zhang