Hello MEMS community,
I would like to ask you this information:
I would need to use for my fabrication process
a smooth sacrificial polymer layer, but this polymer layer
should survive a plasma CVD deposition on top of it
of the material (amorphous silicon) that I would like
to have as a thin suspended membrane.
I need a polymer because the structure is very fragile
and a dry lift off in pure O2 plasma is very recommended.
The temperature of the plasma cvd deposition
is 250 degrees.
The polymer should be spun on small
chips at a thickness between 300nm and 600nm
so it should be a low viscosity product.

I scanned the search option in the mems-talk database
and I found interesting informations, but the temperature stability
of the sacrificial layer is never discussed.
Any suggestion is very welcome
Best Regards
Johan

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